Specialty Films Products

DA NanoMaterials extends a broad range of high-performance slurries for advanced films, delivering specialized solutions to next-generation technologies.

Contact us for product MSDS.

• Cobalt Specialty Film Slurry

  • Colloidal silica-based slurry for cobalt polishing [BEOL] application
  • Tunable selectivity between Co:Cu [1:2.7 to 1:8]
  • Optimized chemistry provides high polish rates and excellent defect performance
  Cobalt Product Sheet
  

• Nickel Specialty Film Slurry

  • Tunable selectivity for polishing nickel films for memory applications
  • Colloidal silica-based operating in the basic pH regime
  Nickel Product Sheet
  

• Ruthenium Barrier Slurry

  • Tunable selectivity for polishing ruthenium for barrier [BEOL] applications
  • Colloidal silica-based operating in the basic pH regime
  • High Ru rates [> 400 Å/min] achieved at low pressures [1 psi]
  • Chemistry-optimized to prevent any harmful oxide formation
  Ruthenium Product Sheet
  

• Copper CMP
• Barrier CMP
• Tungsten CMP
• Shallow Trench Isolation [STI] CMP
• ILD and PMD CMP
• Specialty Films
• PRAM [GST/IST]
• 3D Packaging CMP
• Wafer Polish Products