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CoppeReady® Cu405 Barrier Slurry
- Non Selective Slurry with Highly Tunable Copper, Barrier and Dielectric Rates
- Proven Performance on Numerous Advanced Low-k Dielectric Films
- Qualified in 45nm Production Processes
- Improved Cost of Ownership using DuPont Air Products NanoMaterials' DCmP™ Formulations
- Datasheet [PDF, 223KB]
- MSDS [PDF, 28KB]
CoppeReady® CMPDP6545M-05 Barrier Slurry
- Non Selective Slurry with Highly Tunable Copper, Barrier and Dielectric Rates
- Proven Performance on Numerous Low-k Dielectric Films
- Qualified in 45nm Production Process
- Improved Cost of Ownership Using DuPont Air Products NanoMaterials' DCmP™ Formulations
- Datasheet [PDF, 219KB]
Ruthenium Barrier Slurry
- Non Selective Slurry with Highly Tunable Copper, Ruthenium and Dielectric Rates
- Low solids conc., basic pH chemistry, colloidal silica particles
- Designed to meet 32 nm criteria for Ru barrier application
- Datasheet [PDF, 269KB]
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